发明名称 Method of manufacturing semiconductor light emitting element
摘要 A method of manufacturing the semiconductor light emitting element comprises a semiconductor layer forming step of forming the multilayered nitride semiconductor layer on the first wafer having a transparent property; a bonding step of bonding the multilayered nitride semiconductor layer to the first wafer; a groove forming step of forming the groove extending from the lower surface of the first wafer to the multilayered nitride semiconductor layer; a light applying step of applying a first light to the lower surface of the multilayered nitride semiconductor layer through the first wafer to reduce a bonding force between the multilayered nitride semiconductor layer and the first wafer; a separating step of separating the first wafer from the multilayered nitride semiconductor layer; and a cutting step of cutting the second wafer along the groove to divide into a plurality of the semiconductor light emitting element.
申请公布号 US8399272(B2) 申请公布日期 2013.03.19
申请号 US20090998521 申请日期 2009.10.27
申请人 YAMAE KAZUYUKI;FUKSHIMA HIROSHI;YASUDA MASAHARU;IWAHASHI TOMOYA;KAMEI HIDENORI;MAEDA SYUUSAKU;PANASONIC CORPORATION 发明人 YAMAE KAZUYUKI;FUKSHIMA HIROSHI;YASUDA MASAHARU;IWAHASHI TOMOYA;KAMEI HIDENORI;MAEDA SYUUSAKU
分类号 H01L21/786 主分类号 H01L21/786
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