发明名称 |
Substrate processing apparatus and exhaust method therefor |
摘要 |
A substrate processing apparatus includes a processing chamber for accommodating therein a processing target substrate; a gas exhaust path through which a gas inside the processing chamber is exhausted; one or more exhaust pumps provided in the gas exhaust path; and a scrubber for collecting harmful components from an exhaust gas. The apparatus further includes an ionized gas supply unit for supplying to the gas exhaust path an ionized gas for neutralizing charged particles included in the exhaust gas flowing therethrough. |
申请公布号 |
US8398745(B2) |
申请公布日期 |
2013.03.19 |
申请号 |
US20100726612 |
申请日期 |
2010.03.18 |
申请人 |
YAMAWAKU JUN;OIKAWA JUNJI;NAKAYAMA HIROYUKI;TOKYO ELECTRON LIMITED |
发明人 |
YAMAWAKU JUN;OIKAWA JUNJI;NAKAYAMA HIROYUKI |
分类号 |
B03C3/019;B03C3/36 |
主分类号 |
B03C3/019 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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