发明名称 METHODS OF AND APPARATUS FOR ACCESSING PROCESS CHAMBER USING DUAL ZONE GAS INJECTOR WITH IMPROVED OPTICAL ACCESS
摘要 <P>PROBLEM TO BE SOLVED: To provide a gas injector which can reduce etching of and deposition on an optical access window and maintain a desired SNR at a diagnostic end point. <P>SOLUTION: An injector provides optical access to the inside of a process chamber S-IN along an axial path from a diagnostic end point S-OUT outside the process chamber through an optical access window 70. A hollow housing body 90 receives first and second process gases, and surrounds the axial path. A sleeve 92 in the body is urged against the housing body to minimize particle generation, and defines a first gas bore 106 injecting the first process gas into the process chamber. A second gas bore 124 of the sleeve surrounds the axial path for injecting the second process gas into the process chamber, allowing an optical signal to have a desired signal-to-noise ratio (SNR) at the end point. A septum 126 is provided in the second bore, to divide the second bore into apertures 136. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013051206(A) 申请公布日期 2013.03.14
申请号 JP20120236357 申请日期 2012.10.26
申请人 LAM RESEARCH CORPORATION 发明人 JEFF A BOGART;LEONARD SHARPLESS;SINGH HARMEET
分类号 H05H1/46;C23C16/455;H01L21/205;H01L21/3065;H01L21/31 主分类号 H05H1/46
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