发明名称 METHOD FOR PRODUCING CRYSTAL SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a means by which a crystal substrate is produced at a low cost. <P>SOLUTION: The method includes growing a crystal film (30) on a crystal growth surface (21) of a ground substrate (20) held by a substrate holding tool (10) of a vapor deposition apparatus, and then producing a crystal substrate (35) having a diameter &Phi; nearly equal to any one of 2 in, 2.5 in, 3 in, 4 in, 5 in, 6 in, 50 mm, 75 mm, 100 mm, 125 mm, and 150 mm, from the crystal film (30). The substrate holding tool (10) is equipped with an opening part (12) for exposing a portion of the crystal growth surface (21) of the ground substrate (20), the opening part (12) includes a circular arc-shaped part (13) in its contour, and the circular arc-shaped part (13) has a diameter approximately equal to the diameter &Phi;. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013049593(A) 申请公布日期 2013.03.14
申请号 JP20110187806 申请日期 2011.08.30
申请人 NICHIA CORP 发明人 ICHIRAKU YOJIRO;MAEDA TATSUYA
分类号 C30B25/12;C30B29/38 主分类号 C30B25/12
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