| 摘要 |
PURPOSE: A low temperature thin film deposition method using plasma is provided to secure the deposition quality of a thin film as a low temperature deposition system. CONSTITUTION: A low temperature thin film deposition method using plasma comprises the next step. The plasma is generated inside a thin film deposition chamber. Positive voltage is added to a metal-substrate to guide electronics of plasma toward the metal-substrate. The accelerated electronics crashes the surface of the metal-substrate in order to heat the metal-substrate. |
