APPARATUS AND METHOD FOR MONITORING PROCESS CHAMBER

摘要

PURPOSE: An apparatus and method for monitoring a process chamber are provided to monitor a substrate process by measuring an inner environment of a process chamber in the same condition as a substrate processing environment. CONSTITUTION: A substrate is processed in a plurality of process chambers(40). A sensor is mounted on a measurement unit to measure the inner environment of the process chamber. A transfer unit(52) transfers the measurement unit to each process chamber. The measurement unit includes a transmitting unit to transmit the data measured in the sensor.