| 摘要 |
PURPOSE: A method and a device for measuring the thickness of a thin film layer using X-rays are provided to simply and easily measure the thickness of the thin film layer for measuring the object with a thin layer formed on a substrate or a base layer. CONSTITUTION: A device for measuring the thickness of a thin film layer using X-rays comprises an X-ray generating unit, a detecting device, and a control unit. The X-ray generating unit irradiates X-rays to a reference specimen, or a base layer of a target specimen, or the thin film layer. The detecting device detects the strength of the signals being emitted from the reference specimen or the target specimen. The control unit determines a calibration curve by comparing the strength difference of the signals emitted by a specific component included in the base layer of the reference specimen and the thickness of the thin film layer of the target specimen by comparing the strength difference of the signals emitted by the specific component included in the reference specimen and target specimen with the base layer where the thin film layer is formed with the calibration curve. [Reference numerals] (AA) X-ray generating unit; (BB) Si, Ca or Ag X-ray detecting device; (CC) Checking the size of a Si or Ag signal through control of coating parameters |
