| 摘要 |
The present invention provides a substrate processing apparatus. A substrate processing apparatus used for multiple processing chambers and used for processing substrates are connected in a vacuum conveying chamber, the size increasing of a device for dismounting the cover bodies of the processing chamber is inhibited, and the occupying area increasing in also inhibited. A cover body keeping mechanism (741) for keeping cover bodies (52) and dismounting is more universal. The substrate processing apparatus is provided with the cover body keeping mechanism (741) on a rotary arm (7) extending from a rotary table (721) on a vacuum conveying chamber (4), the cover body keeping mechanism (741) can pass through along the circumference of the vacuum conveying chamber (4) and convolute above the processing chambers (5) when the processing chambers (5) or the cover bodies (52) of a load lock vacuum chamber (3) are kept. |
