| 摘要 |
A photoresist resin composition for a column spacer is provided to ensure high glass transition temperature and improved adhesion and developability and to produce a pattern having excellent heat resistance and good film flatness, remaining rate, and pattern profile. A photoresist resin composition for a column spacer comprises (a) an alkali-soluble copolymer containing an unsaturated carboxylic acid ester compound obtained by reacting a C1-5 hydroxyalkyl unsaturated carboxylic acid ester compound with a lactone or cyclic acid anhydride having at least one alicyclic structure in the presence of a catalyst, (b) a polyfunctional acrylic monomer having at least two ethylenically unsaturated bonds, (c) a photopolymerization initiator, and (d) a solvent. |
