GAS SUPPLY DEVICE AND BOARD TREATMENT APPARATUS COMPRISING THEREOF

摘要

PURPOSE: A gas supply device and a substrate processing device including the same are provided to improve process efficiency by distributing process gas from the center to the outside. CONSTITUTION: A main body(310) is fixed to a chamber. A plurality of process gas inputting units(320) are formed on the upper side of the main body and are independently connected to a plurality of process gases. A core part(330) is connected to the lower side of the main body and includes a hole pattern(331) which is independently connected to the plurality of process gas inputting units. A plurality of process gas supply tubes(340) independently connect the plurality of process gas inputting units to the hole pattern. A plurality of injectors(350) are independently connected to the hole pattern and are radially arranged.