发明名称 PLASMA DEVICE USING GRAPHENE AND METHOD OF MANUFACTURING THE SAME
摘要 PURPOSE: A plasma device using graphene and a manufacturing method thereof are provided to improve plasma properties by comprising materials including graphene at a protection film. CONSTITUTION: A cavity forming part(170) comprises at least one cavity(C). The cavity accommodates discharge gas. First and second electrode parts(120,180) apply voltage to the cavity. The first and second electrode parts are prepared at the upper and lower parts of the cavity forming part, respectively. A protection film(PL) is formed at a part of the inner wall of the cavity. The protective film is made of materials including graphene.
申请公布号 KR20130022505(A) 申请公布日期 2013.03.07
申请号 KR20110084828 申请日期 2011.08.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JUNG SUB;HWANG, SUNG WON;LEE, JIN SUB;SONE, CHEOL SOO
分类号 H01J17/49;H01J9/20 主分类号 H01J17/49
代理机构 代理人
主权项
地址