发明名称 |
PLASMA ASSISTED DEPOSITION OF MO/SI MULTILAYERS |
摘要 |
The disclosure is directed to multilayer Mo/Si coatings for reflective mirrors used in extreme ultraviolet lithographic systems and to a method of making such mirrors using plasma ion assisted deposition (PIAD) techniques. The coating are deposited on a substrate suitable for EUV lithography, and are Mo/Si coating consisting of 40-100 Mo/Si periods, each period consisting on a Mo layer followed by a Si layer. Each of the individual Mo and Si layers is deposited to a specified or target thickness in the range of 2 nm to 5 nm, and the thicknesses are controlled to ±0.1 nm. A plasma from a plasma source is used to densify and smooth the substrate prior to deposition of the coating, and each layer of the coating is plasma densified and smoothed. |
申请公布号 |
EP2563947(A1) |
申请公布日期 |
2013.03.06 |
申请号 |
EP20110721856 |
申请日期 |
2011.04.29 |
申请人 |
CORNING INCORPORATED |
发明人 |
SCHREIBER, HORST;WANG, JUE |
分类号 |
C23C14/32;C23C14/22;C23C14/58 |
主分类号 |
C23C14/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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