发明名称 |
Electrostatic chuck and apparatus for treating substrate including the same |
摘要 |
An electrostatic chuck for an apparatus for treating a substrate includes a body; an insulating plate attached onto a top surface of the body, wherein the substrate is disposed on the insulating plate; an electrode in the insulating plate; a temperature controlling unit including a heating unit and a cooling unit under the electrode and in the insulating plate; and a thermal conduction unit disposed between the electrode and the temperature controlling unit. |
申请公布号 |
US8388757(B2) |
申请公布日期 |
2013.03.05 |
申请号 |
US20080257480 |
申请日期 |
2008.10.24 |
申请人 |
NAM CHANG KIL;JUSUNG ENGINEERING CO., LTD. |
发明人 |
NAM CHANG KIL |
分类号 |
C23C14/50 |
主分类号 |
C23C14/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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