发明名称 |
METHOD FOR FORMING METAL LINE |
摘要 |
PURPOSE: A method for manufacturing a metal line is provided to minimize attack against a metal oxide layer. CONSTITUTION: A metal oxide film is formed on a substrate. A copper metal layer is formed on the metal oxide layer. A photoresist material is selectively left on the copper metal layer. An upper copper metal layer is etched by using etching solution which includes hydrogen peroxide, azole compound, sulfonic acid, and water. |
申请公布号 |
KR20130021322(A) |
申请公布日期 |
2013.03.05 |
申请号 |
KR20120081099 |
申请日期 |
2012.07.25 |
申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
LEE, HYUN KYU;LEE, SUK;JUNG, KYUNG SUB |
分类号 |
G02F1/1368;C09K13/00 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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