发明名称 |
Adjustable holding voltage ESD protection device |
摘要 |
An electrostatic discharge (ESD) protection structure comprises a bipolar PNP transistor having an emitter formed by a first high voltage P type implanted region disposed underneath a first P+ region and a collector formed by a second high voltage P type implanted region disposed underneath a second P+ region. The ESD protection structure can have an adjustable threshold voltage by controlling the distance between the first high voltage P type implanted region and the second high voltage P type implanted region. Based upon a basic ESD protection structure, the ESD protection device can provide a reliable ESD protection for semiconductor devices having different voltage ratings. |
申请公布号 |
US8390096(B2) |
申请公布日期 |
2013.03.05 |
申请号 |
US20100952641 |
申请日期 |
2010.11.23 |
申请人 |
HWANG HSIN-YEN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
HWANG HSIN-YEN |
分类号 |
H01L29/66 |
主分类号 |
H01L29/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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