METHOD FOR FORMING METAL LINE

摘要

PURPOSE: A method for forming a metal line is provided to minimize attack against a metal oxide layer. CONSTITUTION: A metal oxide layer is formed on a substrate. A copper metal layer is formed on the metal oxide layer. A photoresist material selectively remains on the copper metal layer. An upper copper metal layer is etched by using etching solution. The etching solution includes azole compound, hydrogen peroxide, organic peroxyacid, and water.