| 摘要 |
A substrate cleaning device (10) is provided with a substrate support portion (16) for supporting a substrate (12) in a downward-facing orientation; a cleaning plate (24) that has a cleaning liquid support face (22), where the cleaning plate (24) is positioned in an upward-facing orientation at an operating position able to face the liquid support face (22) of a first face (12a) of the substrate (12) that is supported by the substrate support portion (16) across a gap G that has a specific dimension; a cleaning liquid supply portion (26) for supplying a cleaning liquid to a central region (22a) of the liquid support face (22) of the cleaning plate (24); and a cleaning plate drive portion (28) for rotating the cleaning plate (24) around a cleaning plate axis (24a) that is substantially perpendicular to the liquid support face (22). The substrate cleaning device (10) cleans the first face (12a) by causing the cleaning liquid that flows along the liquid support face (22) of the cleaning plate (24), which is rotated around the cleaning plate axis (24a), to contact the first face (12a) of the substrate (12). |
