| 摘要 |
<p>An exposure apparatus includes a first member (30) disposed at least in a part of a periphery of an optical path (K) of the exposure light, having a first face (310) facing an upper face of an object through a first gap (Wl) and holding the liquid (LQ) between the up¬ per face of the object and the first face; a second member (60) dis¬ posed at an outer side of the first face with respect to the optical path and having a second face (61) facing the upper face of the ob¬ ject through a second gap; a first supply port (64) disposed at an out¬ er side of the second face for supplying a fluid (LB); and a first suc¬ tion port (33) disposed between the first face and the second face for sucking at least part of gas (Ga) in an outer space of the second member via a gap (W2) between the second face and the upper face of the object.</p> |
