Processing substrate using ion beam, comprises generating ion beam from ion beam source, and directing ion beam on surface for processing substrate, in which ion beam is passed through aperture that is made of carbon-containing material

摘要

Processing substrate (2) using an ion beam (1a) according to , comprises generating the ion beam from an ion beam source (1.1) of an ion beam apparatus (1), and directing the ion beam on a surface (2.1) for processing the substrate, in which the ion beam is passed through an aperture, which is at least partially made of carbon-containing material, where electrons are generated downstream to the aperture, at the outer side of a shading region of the aperture and/or in the outlet direction of the ion beam, which are directed towards the surface of the substrate. Processing substrate (2) using an ion beam (1a) according to , comprises generating the ion beam from an ion beam source (1.1) of an ion beam apparatus (1), and directing the ion beam on a surface (2.1) for processing the substrate, in which the ion beam is passed through an aperture, which is at least partially made of carbon-containing material, where a reactant that is reactive with carbon is conducted in a directed flow between the aperture and the substrate such that carbon passed from the aperture is oxidized by the ion beam, and electrons are generated downstream to the aperture, at the outer side of a shading region of the aperture and/or in the outlet direction of the ion beam, which are directed towards the surface of the substrate. An independent claim is also included for an ion beam apparatus for carrying out the above method, comprising (i) the ion beam source for generating the ion beam, (ii) at least one aperture for adjusting a cross section of the ion beam, which is arranged between the ion beam source and the substrate, where the ion beam is guidable through the aperture and the aperture is formed of carbonaceous material, (iii) a supply unit provided for supplying the reactive precursor having carbon, where the supply unit is arranged such that the precursor is guidable in the directional flow between the aperture and the substrate, such that carbon passed from the aperture is oxidized by the ion beam, and (iv) an electron generating unit arranged outside a shading region of the aperture and/or in the exit direction of the ion beam by the aperture, through which the electrons are guidable on the surface of the substrate.