发明名称 CERAMIC COATING COMPRISING YTTRIUM WHICH IS RESISTANT TO A REDUCING PLASMA
摘要 <p>CERAMIC COATING COMPRISING YTTRIUM WHICH IS RESISTANT TO A REDUCING PLASMAParticulate generation has been a problem in semiconductor device processing in highly corrosive plasma environments. The problem is exacerbated when the plasma is a reducing plasma. Empirically produced data has shown that the formation of a plasma spray coated yttrium-comprising ceramic such as yttrium oxide, Y203 - 7r02 solid solution, YAG, and YF3 provides a low porosity coating with smooth and compacted surfaces when such ceramics are spray coated from a powder feed having an average effective diameter ranging from about 22pm to about 0.1 pm. These spray- coated materials reduce the generation of particulates in corrosive reducing plasma environments.Figure 6</p>
申请公布号 SG187415(A1) 申请公布日期 2013.02.28
申请号 SG20120096590 申请日期 2009.02.13
申请人 APPLIED MATERIALS, INC. 发明人 SUN, JENNIFER, Y.;HE, XIAOMING;COLLINS, KENNETH S.;GRAVES, THOMAS;THACH, SENH;YUAN, JIE;XU, LI;DUAN, REN-GUAN
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