| 摘要 |
PURPOSE: An in-line film developing apparatus having a cleaning device and a method for fabricating a liquid crystal display device using thereof are provided to improve cleaning power by controlling the injection angle of the cleaning device. CONSTITUTION: A substrate is loaded on a loading unit. A cleaning unit(200) washes the substrate using spraying units(140a,140b). A photo process unit performs a photoresist coating, an exposure, and a developing process on the substrate. An etching unit etches the substrate. An unloading unit unloads the substrate. A loading unit, a cleaning unit, a photo process unit, the etching unit, and the unloading unit are arranged inline. |
