| 摘要 |
PURPOSE: An apparatus for exposing a substrate is provided to uniformly photo-sensitize a pre-set region of the substrate although a plurality of substrates is continuously exposed by preventing the sagging phenomenon of an exposing film. CONSTITUTION: An apparatus for exposing a substrate includes a platen(120), a patterned exposing film(130), a first spraying part(150), and a second spraying part(160). A plate is arranged at the platen. The patterned exposing film is in contact with a substrate(110) to be exposed. The first spraying part sprays air to the contact interface of the substrate and the exposing film to separate the substrate and the exposing film. The second spraying part is installed at the platen and is raised through a hole formed at the substrate. The second spraying part sprays air toward the exposing film to separate the substrate and the exposing film. The apparatus further includes a light source(140) on the upper side of the exposing film. |
