发明名称 Passivation of integrated circuits containing ferroelectric capacitors and hydrogen barriers
摘要 An integrated circuit that includes a logic region, a buffer region, and a ferroelectric capacitor region that contains ferroelectric capacitors. The integrated circuit also includes a hydrogen diffusion barrier film that overlies ferroelectric capacitors and also overlies a buffer region located between a ferroelectric capacitor region and a logic region. However, the hydrogen diffusion barrier film is removed from a portion of the logic region. Moreover, a method for forming a hydrogen barrier layer that overlies ferroelectric capacitors and a buffer region but is removed from a portion of the logic region.
申请公布号 US8384190(B2) 申请公布日期 2013.02.26
申请号 US20100717604 申请日期 2010.03.04
申请人 TEXAS INSTRUMENTS INCORPORATED;SUMMERFELT SCOTT R.;MOISE TED S.;BASIM GUL B. 发明人 SUMMERFELT SCOTT R.;MOISE TED S.;BASIM GUL B.
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址