| 摘要 |
PURPOSE: A substrate cleaning apparatus and method are provided to uniformly dry the whole surface of a substrate by uniformly heating the whole surface of the substrate over the preset temperatures. CONSTITUTION: A container(120) accepts processing liquid which is distributed from a substrate(11). A cleaning liquid supply member supplies a cleaning liquid to a pattern surface(11a) and cleans the substrate. A first liquid supply member supplies a heated first fluid to a non-pattern surface(11b) and heats the substrate. An organic solvent supply member supplies an organic solvent to the pattern surface. A drying gas supply member(500) supplies dry gas to the pattern surface. |
