发明名称 PROCEDIMENTO ED APPARATO DI RILEVAZIONE DELL'ALLINEAMENTO DI UN SUBSTRATO
摘要 <p>A method of detecting the alignment of a substrate during a sequence of printing steps, comprises detecting in a detection unit a position of at least one printing track that forms a printed pattern onto a surface of the substrate in a first printing station, determining a reference point in at least a portion of the printing track, comparing the actual position of the reference point with an expected or previously detected position of the reference point, determining an offset between the actual position and the expected or previously detected position of the reference point, adjusting the reciprocal position between the printing head of a second printing station and the substrate to account for the determined offset, and then printing a second pattern over the first pattern.</p>
申请公布号 IT1398427(B1) 申请公布日期 2013.02.22
申请号 IT2009UD00148 申请日期 2009.09.03
申请人 APPLIED MATERIALS, INC. 发明人 PASQUALIN GIANFRANCO;CELLERE GIORGIO;BACCINI ANDREA;GALIAZZO MARCO;VERCESI TOMMASO;DE SANTI LUIGI
分类号 主分类号
代理机构 代理人
主权项
地址