| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment device for exposure equipment, capable of performing an alignment of a substrate with a mask with high precision. <P>SOLUTION: An alignment device includes an alignment light source 5 incorporated in, for example, a camera 6 for emitting light used for alignment. And the alignment light source 5, for example, emits the alignment light coaxially with an optical axis of a light detected by the camera 6. The alignment light is irradiated on a substrate 1 and a mask 2, and the refection light is detected by the camera 6. Since a micro lens array 3 for exposure is also placed in a space between a mask alignment mark 2a and a substrate alignment mark 1a, an erect unmagnified image reflected from the substrate alignment mark 1a is formed on the mask 2. Then a controller 9 performs an alignment of the substrate 1 with the mask 2 according to the substrate alignment mark 1a and the reflection light of the mask alignment mark 2a detected by the camera 6. <P>COPYRIGHT: (C)2013,JPO&INPIT |
