| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a silicon embedded glass substrate in which silicon is embedded with high location accuracy and which has small warpage, and a manufacturing method for the silicon embedded glass substrate. <P>SOLUTION: In a silicon embedded glass substrate, silicon is embedded in a glass substrate having a first principal surface and a second principal surface. The glass substrate includes a first glass layer and a second glass layer which have linear expansion coefficients differing from each other. A surface of the first glass layer makes up the first principal surface, and a surface of the second glass layer makes up the second principal surface. <P>COPYRIGHT: (C)2013,JPO&INPIT |
