发明名称 |
EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE |
摘要 |
An exposure apparatus includes: a substrate stage configured to move upon holding the substrate; a structural member configured to support a substrate stage; a first counter mass stage configured to cancel a driving reaction force that is generated due to driving of the substrate stage and acts on the structural member; a substrate stage driver configured to generate a force between the substrate stage and the first counter mass stage; a first counter mass driver configured to generate a force between the structural member and the first counter mass stage; a controller configured to control the first counter mass driver so as to cancel the force that acts on the structural member by generating a force between the structural member and the first counter mass stage using the first counter mass driver.
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申请公布号 |
US2013044306(A1) |
申请公布日期 |
2013.02.21 |
申请号 |
US201213546131 |
申请日期 |
2012.07.11 |
申请人 |
CANON KABUSHIKI KAISHA;EMOTO KEIJI;ASANO TOSIYA |
发明人 |
EMOTO KEIJI;ASANO TOSIYA |
分类号 |
G03B27/58 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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