METHOD FOR FABRICATING HIGH CONTRAST STACKS

摘要

The embodiments disclose a method for fabricating high contrast stacks, including depositing materials on a substrate to form an antiferromagnetic coupling thin film layer on top of a first half of the magnetic layer of a stack, depositing a portion of a second half of the magnetic layer on top of the antiferromagnetic coupling thin film layer to couple the first and second half of the magnetic layers to the antiferromagnetic coupling thin film layer and bit-patterning a portion of the second half of the magnetic layer and the antiferromagnetic coupling thin film layer.