发明名称 LAMP OF EXPOSURE APPARATUS IN PHOTO LITHOGRAPHY SYSTEM OR LCD HARDENING SYSTEM
摘要 <p>PURPOSE: An exposure apparatus in a photo lithography system or a lamp in an LCD hardening system is provided to reduce maintenance costs by not using a filter. CONSTITUTION: The surface of a lamp(100) is coated to form a coating film(200). The coating film is used as an exposure filter. The coating film includes a dielectric thin film. A metal thin film is deposited on the electrode part(130) of the lamp.</p>
申请公布号 KR20130016681(A) 申请公布日期 2013.02.18
申请号 KR20110078756 申请日期 2011.08.08
申请人 ISK., LTD.;KIM, WOO SUB 发明人 KIM, WOO SUB
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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