PATTERN FORMING METHOD, MULTILAYER RESIST PATTERN, MULTILAYER FILM FOR DEVELOPMENT WITH ORGANIC SOLVENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern forming method, by which a pattern with good line width roughness (LWR) and a rectangular profile can be formed, and to provide a multilayer resist pattern formed by the method, a multilayer film for development with an organic solvent suitably used for the pattern forming method, and a resist composition suitably used for the pattern forming method, a method for manufacturing an electronic device, and an electronic device.

SOLUTION: The pattern forming method includes steps of: (1) forming a first film on a substrate by using a first resin composition (I); (2) forming a second film on the first film by using a second resin composition (II) different from the resin composition (I); (3) exposing a multilayer film having the first film and the second film; (4) developing the first film and the second film in the exposed multilayer film by using a developing solution containing an organic solvent to form a negative pattern.

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