APPARATUS AND METHOD FOR TREATING SUBSTRATE

摘要

PURPOSE: An apparatus and method for processing a substrate are provided to prevent the substrate from being spattered with processing solutions by spraying fluid to an inner sidewall of a housing which surrounds a spin head. CONSTITUTION: A spin head(340) rotates and supports a substrate. A spray member(380) supplies processing solutions to the substrate. A housing(320) surrounds the spin head. A fluid supply unit supplies fluid to a hole. The hole sprays the fluid to the inner side of the housing.