发明名称 METHOD FOR POLISHING GLASS SUBSTRATE, METHOD FOR MANUFACTURING PACKAGE, PIEZOELECTRIC VIBRATOR, OSCILLATOR, ELECTRONIC APPARATUS AND RADIO-CONTROLLED TIMEPIECE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for polishing a glass substrate which can improve the surface accuracy of a joint surface of a glass substrate to secure air-tightness in a cavity, and to provide a method for manufacturing a package, a piezoelectric vibrator, an oscillator, an electronic apparatus and a radio-controlled timepiece. <P>SOLUTION: The method for polishing a glass substrate includes a polishing step where a joint surface 53 of a wafer 50 for a lid substrate is polished while an abrasive is fed thereto. The polishing step includes: a pre-stage polishing step of polishing the joint surface 53 of the wafer 50 for a lid substrate while using a first abrasive containing a cerium oxide as the principal component; and a post-stage polishing step of polishing the joint surface 53 of the wafer 50 for a lid substrate while using a second abrasive containing a colloidal silica as the principal component. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013031909(A) 申请公布日期 2013.02.14
申请号 JP20110170096 申请日期 2011.08.03
申请人 SEIKO INSTRUMENTS INC 发明人 FUJIHIRA YOICHI
分类号 B24B37/00;B24B7/24;B24B37/24;G04G3/00;G04G5/00;G04R20/00;H03B5/32;H03H3/02;H03H9/02;H03H9/10 主分类号 B24B37/00
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