发明名称 |
CLEANING METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING SYSTEM |
摘要 |
<p>A cleaning method comprises: cleaning the liquid contact member by supplying a first liquid for cleaning to the liquid contact member; recovering the first liquid supplied to the liquid contact member; supplying a second liquid different from the first liquid to the liquid contact member after the liquid contact member is cleaned with the first liquid; recovering the second liquid supplied to the liquid contact member; and performing a process in which a concentration of the first liquid comprised in the recovered second liquid is set to a predetermined concentration or less.</p> |
申请公布号 |
KR20130014685(A) |
申请公布日期 |
2013.02.08 |
申请号 |
KR20127028438 |
申请日期 |
2011.04.04 |
申请人 |
NIKON CORPORATION |
发明人 |
TANAKA RYO;KANAI SUGURU;SHIRAISHI KENICHI;WATANABE SHUNJI;SHIBUYA TAKASHI |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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