发明名称 REFLECTING BASE MATERIAL, BACKLIGHT UNIT, AND METHOD FOR MANUFACTURING REFLECTING BASE MATERIAL
摘要 A reflecting base material that can reliably prevent the occurrence of uneven brightness, a backlight unit that uses the same, and a method for manufacturing the same are provided. Surface profile information of the reflecting base material 7 is obtained by a laser displacement gauge 3. Next, the unevenness information obtained is subjected to Fourier transform, and the relationship between frequency and intensity for the surface unevenness profile of the reflecting base material is obtained. Next, the calculated relationship between the frequency and intensity is compared with a preset standard data. When the intensity exceeds 0.6 at a predetermined range of frequency domain, a judgment of rejection is made; when no data exceeding 0.6 exists in said judgment domain, a judgment of acceptance is made.
申请公布号 US2013033899(A1) 申请公布日期 2013.02.07
申请号 US201213616875 申请日期 2012.09.14
申请人 FURUKAWA ELECTRIC CO., LTD.;NISHIWAKI TOSHIMITSU;MORITA NOBUYUKI;ISHIKAWA AKIHIKO;YAMANE MOTOHIRO;HAYASHI DAISUKE;KAWAI KOICHI;SATOH YUSUKE 发明人 NISHIWAKI TOSHIMITSU;MORITA NOBUYUKI;ISHIKAWA AKIHIKO;YAMANE MOTOHIRO;HAYASHI DAISUKE;KAWAI KOICHI;SATOH YUSUKE
分类号 F21V8/00;B29D11/00;G02B27/00 主分类号 F21V8/00
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