FEEDSTOCK GASIFICATION AND SUPPLY DEVICE

摘要

The purpose of the present invention is to employ a pressure type flow rate control device to control the flow rate of feedstock vapors generated by heating a solid feedstock or a liquid feedstock, while affording a consistent supply to the processing chamber, to thereby make the feedstock gasification and supply device more compact, improve the quality of semiconductor products, and facilitate management of residual feedstock. This feedstock gasification and supply device comprises: a source tank for storing feedstock; a feedstock vapor supply path for supplying feedstock vapors from the internal space of the source tank to a processing chamber; a pressure type flow rate control device intervening in the feedstock vapor supply path, for controlling the flow rate of feedstock vapors supplied to the processing chamber; and a constant-temperature heating section for heating the source tank, the supply path, and the pressure type flow rate control device to a set temperature. The feedstock vapors generated in the internal space of the source tank are supplied to the processing chamber, while the flow rate is controlled by the pressure type flow rate control device.