| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novel silsesquioxane compound obtained by introducing a group derived from an adamantane compound, and a method for producing the same, and to provide a resist material that stably forms fine patterns with high accuracy because of its low LER (Line Edge Roughness). <P>SOLUTION: The silsesquioxane compound is provided, in which R1 represents a group represented by chemical formula (a), wherein R<SP POS="POST">2</SP>represents an alkyl group. <P>COPYRIGHT: (C)2013,JPO&INPIT |
