发明名称 |
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PRODUCTION METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE |
摘要 |
The present invention relates to a pattern forming method comprising: (1) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) of which the polarity increases by the action of an acid and thereby the solubility in a developer containing an organic solvent decreases and a compound (B) which generates an acid which is represented by the following general formula (I) by irradiation with actinic rays or radiation; (2) exposing the film; and (3) forming a negative-type pattern by developing with a developer which contains an organic solvent, the actinic ray-sensitive or radiation-sensitive resin composition and the resist film which are used in the method, a method for preparing an electronic device and the electronic device.
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申请公布号 |
US2013034706(A1) |
申请公布日期 |
2013.02.07 |
申请号 |
US201213540123 |
申请日期 |
2012.07.02 |
申请人 |
FUJIFILM CORPORATION;YAMAGUCHI SHUHEI |
发明人 |
YAMAGUCHI SHUHEI |
分类号 |
G03F7/027;B32B3/10;G03F7/20 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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