System and method for monitoring copper barrier layer preclean process

摘要

A monitor wafer for use in monitoring a preclean process and method of making same are described. One embodiment is a monitor wafer comprising a silicon base layer; a capping layer disposed on the silicon base layer; and a barrier layer disposed on the USG layer. The monitor wafer further comprises a copper (Cu) seed layer disposed on the barrier layer; and a thick Cu layer disposed on the Cu seed layer.