| 摘要 |
A method and apparatus for fabricating a flat panel display device is disclosed. A thin film is patterned in a patterning process using a soft mold without using a photo process. A thin film layer and a resist are sequentially formed on a substrate. A designated resist pattern is formed by applying pressure to the resist using a soft mold. The resist has a dipole moment μ value equal to or higher than 2 (D), or has a solubility parameter value lower than 6 (cal/cm3)1/2 or higher than 11 (cal/cm3)1/2.
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