| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for generating wiring pattern data which improves throughput of electron beam exposure for a wiring pattern. <P>SOLUTION: A method for generating wiring pattern data includes: a step S2 for generating a plurality of parallel wiring patterns to which a track pattern is connected; a step S4 for generating a track pattern in which route end parts of different wiring routes are not disposed in the same track pattern; a step S6 for cutting a track pattern terminal end part, though which the wiring route does not pass, out of a track pattern terminal end part of a track pattern in which the route end part is disposed and a track pattern terminal end part of an adjacent track pattern connected to a track pattern starting end part of the track pattern; and a step S10 for generating wiring pattern data having a block pattern identifier corresponding to a basic block pattern in which the track pattern is juxtaposed after cutting the track pattern terminal end part and an arrangement position of the basic block pattern. <P>COPYRIGHT: (C)2013,JPO&INPIT |
