发明名称 OPTICAL WAVEGUIDE AND METHOD FOR MANUFACTURING OPTICAL WAVEGUIDE
摘要 <P>PROBLEM TO BE SOLVED: To form an optical waveguide with good crystallinity on a thermal insulation layer pattern comprising an insulator. <P>SOLUTION: A buried layer 3 is formed on a thermal insulation layer pattern 2 comprising an insulator by epitaxial growth utilizing a semiconductor crystal plane 1A on a substrate 1 exposed from the thermal insulation layer pattern 2 as a nuclei. The buried layer 3 is epitaxially grown in the lateral direction on the thermal insulation layer pattern 2, and thereby, the thermal insulation layer pattern 2 is buried. Since the buried layer 3 can be formed on the thermal insulation layer pattern 2 by epitaxial growth, an optical waveguide 10 comprising a semiconductor crystal can be formed on the thermal insulation layer pattern 2. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013026254(A) 申请公布日期 2013.02.04
申请号 JP20110156289 申请日期 2011.07.15
申请人 SUMITOMO ELECTRIC IND LTD 发明人 MIURA TAKAMITSU
分类号 H01S5/12;H01L21/205;H01S5/026 主分类号 H01S5/12
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