| 发明名称 |
ETCHING SOLUTION COMPOSITION FOR STRONTIUM TITANATE, METHOD FOR PRODUCING SHAPE-PROCESSED STRONTIUM TITANATE FILM, AND METHOD FOR PROCESSING THE STRONTIUM TITANATE FILM |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: an etching solution composition for strontium titanate capable of wet-etching a strontium titanate film without generating a defect such as a crack; a method for producing a shape-processed strontium titanate film by utilizing the etching solution composition; and a method for processing the strontium titanate film. <P>SOLUTION: This etching solution composition for strontium titanate comprises aqueous solution containing hydrofluoric acid and nitric acid. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013023409(A) |
申请公布日期 |
2013.02.04 |
| 申请号 |
JP20110159665 |
申请日期 |
2011.07.21 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD;NAGOYA UNIV |
发明人 |
ONO TAKASHI;HAGIWARA MITSUO;FUJIMURA SATOSHI;OTA HIROMICHI |
| 分类号 |
C30B33/10;C01G23/00;C23F1/30;C30B29/62;H01L21/306;H01L21/308 |
主分类号 |
C30B33/10 |
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