发明名称 |
APPLICATION APPARATUS FOR APPLICATION LIQUID |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an application-liquid application apparatus capable of maintaining a fine application state by determining the quality of the discharge state of the application liquid from discharge holes while suppressing consumption of the application liquid as much as possible. <P>SOLUTION: The application-liquid application apparatus for discharging droplets of the application liquid from a plurality of discharge holes 7b arrayed in a line on a discharge surface 7a of an application head 7 by driving piezoelectric elements 7e formed correspondingly to respective discharge holes 7b and applying the application liquid to an application target such as a substrate W includes: an ultrasonic oscillation device 8 to be an oscillation device for generating oscillation of a predetermined frequency; and a control device 13 for determining the quality of the discharge state of droplets of the application liquid from respective discharge holes 7b based on output signals outputted from the piezoelectric elements 7e in accordance with the oscillation of the ultrasonic oscillation device 8. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013022562(A) |
申请公布日期 |
2013.02.04 |
申请号 |
JP20110162283 |
申请日期 |
2011.07.25 |
申请人 |
SHIBAURA MECHATRONICS CORP |
发明人 |
OKABE YOSHITAKA |
分类号 |
B05C11/00;B05C5/00;H01L21/027 |
主分类号 |
B05C11/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|