| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity exposure apparatus and a mask holding mechanism, even when a mask is enlarged, capable of highly accurately performing exposure by retaining highly accurate parallelism between a mask and a substrate when holding the mask. <P>SOLUTION: A holder frame 21 constituting the mask holding mechanism of the proximity exposure apparatus includes: a plurality of protrusions 212 that are attached to an opening part protrudingly from the respective sides; a plurality of air springs 23 attached to the protrusions; and tilt drive motors 22 that are provided at three or four parts of the mask holder mounted on the protrusions via the air springs and apply adjusting power thereto such that the mask is disposed parallel to the surface of a substrate at a predetermined minute gap from the substrate. At least a part of the plurality of air springs includes an adjusting mechanism comprising a compressor, an accumulator, and a control valve 233 for adjusting an internal pressure of the air spring. <P>COPYRIGHT: (C)2013,JPO&INPIT |
