SUBSTRATE SUPPORT PLATE FOR PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A board support stand of a plasma processing device is provided to facilitate an assembly process by preventing an O-ring from being dislocated in a combination process. CONSTITUTION: A bottom plate(20) upwardly transmits cooling gas. The cooling gas is supplied through a chuck. A top plate(30) receives the bottom plate in the rear thereof. The top plate forms a flow path to which the cooling gas is supplied. A sealing member(40) seals the flow path between the top plate and the side of the bottom plate.