发明名称 SUBSTRATE PROCESSING APPARATUS AND LIQUID EXCHANGE METHOD FOR THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To pass a liquid to an inner tank drain pipeline at the time of temperature control after the liquid exchange so as to prevent an adverse effect on a waste fluid facility and to prevent an adverse effect on a device and process failure. <P>SOLUTION: After a controlling unit 33 discharges an old phosphoric acid solution, a new phosphoric acid solution is fed to a processing tank 1. The temperature control of the phosphoric acid solution is performed as the phosphoric acid solution is circulated with a pump AP in a normal circulation passage from an outer tank 5, through a circulation pipeline 7 to an inner tank 3, and a process liquid is circulated in a temporary passage passing through an inner tank drain pipeline 11 at least once by the completion of the temperature control. Therefore, even if the old phosphoric acid solution is left in the inner tank drain pipeline 11, the old phosphoric acid solution can be replaced by a new phosphoric acid solution. As a result, this can prevent an adverse effect resulting from the old phosphoric acid solution left in the inner tank drain pipeline 11 on a waste fluid facility. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013021232(A) 申请公布日期 2013.01.31
申请号 JP20110154970 申请日期 2011.07.13
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SUGIOKA SHINJI;EBISUI HIROSHI;YOSHIDA SHUNJI
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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