发明名称 Vertical Transistor with Improved Robustness
摘要 A transistor is disclosed that includes a semiconductor body having a first horizontal surface. A drift region is arranged in the semiconductor body. A plurality of gate electrodes is arranged in trenches of the semiconductor body. The trenches have a longitudinal direction and extending parallel relative to each other. The longitudinal direction of the trenches extends in a first lateral direction of the semiconductor body. The body regions and the source regions are arranged between the trenches. The body regions are arranged between the drift region and the source regions in a vertical direction of the semiconductor body. In the first horizontal surface, the source regions and the body regions are arranged alternately in the first lateral direction. A source electrode is electrically connected to the source regions and the body regions in the first horizontal surface.
申请公布号 US2013026561(A1) 申请公布日期 2013.01.31
申请号 US201113194362 申请日期 2011.07.29
申请人 INFINEON TECHNOLOGIES AUSTRIA AG;SANDER RAINALD;WINKLER MARKUS;ASAM MICHAEL;STECHER MATTHIAS 发明人 SANDER RAINALD;WINKLER MARKUS;ASAM MICHAEL;STECHER MATTHIAS
分类号 H01L29/78 主分类号 H01L29/78
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