PRODUCTION OF TARGET FOR SPUTTERING AND TARGET FOR SPUTTERING,申请号JP19910095695-传众专利搜索

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发明名称	PRODUCTION OF TARGET FOR SPUTTERING AND TARGET FOR SPUTTERING
摘要
申请公布号	JPH04325670(A)	申请公布日期	1992.11.16
申请号	JP19910095695	申请日期	1991.04.25
申请人	SEIKO EPSON CORP	发明人	YAMAGISHI TOSHIHIKO
分类号	C23C14/34	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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