METHOD OF MANUFACTURING EXTRACELLULAR ELECTRODES FROM SINGLE CRYSTAL SILICON SUBSTRATE HAVING PARALLEL SIDE WALLS AND ROUNDED EDGES, FORMED BY WET ETCH WHICH METHOD MAY BE INTEGRATED TO CMOS TECHNOLOGY
摘要
申请公布号
HU0900774(A3)
申请公布日期
2013.01.28
申请号
HU20090000774
申请日期
2009.12.10
申请人
MTA PSZICHOLOGIAI KUTATOINTEZET;PAZMANY PETER KATOLIKUS EGYETEM INFORMACIOS TECHNOLOGIAI KAR;MTA TERMESZETTUDOMANYI KUTATOKOEZPONT (MTA TTK)
